A modified lift-off method for fabricating monolithic thin-film edge emitter display Conference Paper uri icon

abstract

  • A modified lift-off method for fabricating monolithic thin-film edge-emitter displays (MT-FEED) using two layers of photoresist separated by a metal film has been developed. Several different experimental structures were fabricated by varying the thickness of dielectric layer that separates anode lines from cathode lines from 3 to 6 microns. The technology is viable for fabricating MT-FEEDs with thin-film phosphors deposited on the anode lines. This is possible since following the complete fabrication of structures, photoresist pillars are lifted-off using solvents that provide no damage to the thin-film phosphor. The technique developed for the fabrication of MT-FEED is simple and reduces the number of steps involved during the fabrication and hence can be successfully used for other edge-emitter devices.

name of conference

  • 14th International Vacuum Microelectronics Conference

published proceedings

  • IVMC 2001. Proceedings of the 14th International Vacuum Microelectronics Conference (Cat. No.01TH8586)

author list (cited authors)

  • Bhatia, V., Karpov, L. D., Kim, H. R., & Weichold, M. H.

citation count

  • 1

complete list of authors

  • Bhatia, V||Karpov, LD||Kim, HR||Weichold, MH

publication date

  • January 2001

publisher