Precision patterning of poly(dimethyl siloxane) as an electrical insulating layer using photoresist lift-off process Conference Paper uri icon


  • A simple poly(dimethylsiloxane) (PDMS) patterning method based on a photoresist lift-off technique for electrical insulation layer with selective openings is presented. The method enables creating patterns with small features in various thicknesses of PDMS layers by adjusting processing parameters without any design limitations and without the need for expensive processing equipments. Electrical resistance measurements between microelectrodes insulated with a patterned PDMS layer showed that it successfully functioned as an electrical insulation layer. Also, successful neuron cell culture on top of a PDMS patterned microelectrodes demonstrated that this fabrication process is biocompatible. 2009 CBMS.

published proceedings

  • Proceedings of Conference, MicroTAS 2009 - The 13th International Conference on Miniaturized Systems for Chemistry and Life Sciences

author list (cited authors)

  • Park, J., Kim, H. S., & Han, A.

complete list of authors

  • Park, J||Kim, HS||Han, A

publication date

  • January 2009