High-Q Evanescent-Mode Filters Using Silicon Micromachining and Polymer Stereolithography (SL) Processing Conference Paper uri icon

abstract

  • Evanescent-mode filters are realized by both silicon micromachining as well as layer-by-layer polymer stereolithography (SL) processing. Capacitive loading an enclosed resonator reduces the size of a distributed cavity to be much smaller than a wavelength but which has much higher unloaded Q than lumped elements. The loaded resonators are extended into reduced-size filters with a low insertion loss due to the relatively high quality factor. Size reduction of resonators and filters can be a full order of magnitude depending on the height of the capacitive post. A 14 GHz resonator micro-machined in silicon with 5 mm/spl times/5 mm/spl times/0.45 mm volume reduces the size by 76.8%. The polymer-based fabrication was used to create a resonator with a Q greater than 1,050. An insertion loss of 0.83 dB was measured in a 1.69% filter with a size reduction of 47%. Furthermore, the proposed filters are quasi-planar and capable of integration with other RF components.

name of conference

  • 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535)

published proceedings

  • 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535)

author list (cited authors)

  • Xun Gong, .., Margomenos, A., Bosui Liu, .., Chappell, W. J., & Katehi, L.

citation count

  • 13

complete list of authors

  • Margomenos, A||Chappell, WJ||Katehi, LPB

publication date

  • January 2004

publisher