Wideband Micromachined Transitions for MEMS Tunable High-Q Filters Conference Paper

abstract

• Two types of micromachined RF transitions for interconnecting coplanar waveguides (CPW) on silicon to microstrip lines suspended on membranes are presented. These transitions are a critical component for developing MEMS tunable high-Q filters for Ka and U-band applications. Their fabrication is based on a DRIE etching process which provides excellent control of the size and shape of the etched structure, therefore excellent control of the transition's RF performance. The presented transitions have sufficient bandwidth for covering the 35-55 GHz range within which the MEMS tunable filters is operating

name of conference

• 2006 European Microwave Conference

authors

• Katehi, Linda

published proceedings

• 2006 European Microwave Conference

author list (cited authors)

• Margomenos, A., Lee, Y., Jain, A., Yao, T., Peroulis, D., & Katehi, L.

citation count

• 3

complete list of authors

• Margomenos, Alexandros||Lee, Yongshik||Jain, Alok||Yao, Terry||Peroulis, Dimitris||Katehi, Linda PB

publication date

• January 2006

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

keywords

• 35 To 55 Ghz
• Circuit Tuning
• Coplanar Waveguides
• Coplanar Waveguides On Silicon
• Drie Etching Process
• Etching
• Filters
• Ka-band Filters
• Membrane Suspended Filters
• Mems Tunable Filters
• Micromachining
• Micromechanical Devices
• Microstrip Lines
• Microstrip Transitions
• Millimetre Wave Filters
• Q-factor
• Radio Frequency
• Rf Mems Varactors
• Rf Performance
• Shape Control
• Silicon
• Silicon Micromachining
• Size Control
• Tunable High-q Filters
• U-band Applications
• Waveguide Transitions
• Wideband
• Wideband Micromachined Rf Transitions

Digital Object Identifier (DOI)

• 10.1109/eumc.2006.281263

start page

• 1336

end page

• 1339

URL

• http://dx.doi.org/10.1109/eumc.2006.281263