Increasing the Utilization of Deep Neural Networks for SEM Measurements Through Multiple Task Formulation and Visualization Academic Article

authors

• Savari, Serap

published proceedings

• IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

author list (cited authors)

• Chaudhary, N., & Savari, S. A.

citation count

• 1

complete list of authors

• Chaudhary, Narendra||Savari, Serap A

publication date

• August 2020

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

published in

• IEEE Transactions on Semiconductor Manufacturing  Journal

keywords

• Deep Learning
• Image Edge Detection
• Line Edge Roughness
• Neural Networks
• Noise Measurement
• Noise Reduction
• Scanning Electron Microscope
• Scanning Electron Microscopy
• Task Analysis
• Visualization

Digital Object Identifier (DOI)

• 10.1109/TSM.2020.2979680

start page

• 322

end page

• 330

volume

• 33

issue

• 3

URL

• http://dx.doi.org/10.1109/tsm.2020.2979680