Quantum lithography beyond the diffraction limit via Rabi oscillations.
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We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.
author list (cited authors)
Liao, Z., Al-Amri, M., & Zubairy, M. S.
complete list of authors
Liao, Zeyang||Al-Amri, M||Zubairy, M Suhail