Quantum lithography beyond the diffraction limit via Rabi oscillations. Academic Article uri icon

abstract

  • We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.

published proceedings

  • Phys Rev Lett

altmetric score

  • 3

author list (cited authors)

  • Liao, Z., Al-Amri, M., & Zubairy, M. S.

citation count

  • 40

complete list of authors

  • Liao, Zeyang||Al-Amri, M||Zubairy, M Suhail

publication date

  • October 2010