A Design Model for Random Process Variability Conference Paper

abstract

• A new approach to analyze process variation through measured current variation is introduced. The methodology concludes with a simple and convenient posynomial model for random process variability to bridge the gap between existing statistical methods and circuit design. The model contains only design variables: transistor sizes W and L, and operating points Vgs and Vds. Modeling random process variability in this way allows for adaptability to optimization problems, time efficient methods for gathering statistical information in comparison to Monte Carlo, and an alternative equation for hand analysis. 2008 IEEE.

name of conference

• 9th International Symposium on Quality Electronic Design (isqed 2008)

authors

• Nowka, Kevin

published proceedings

• 9th International Symposium on Quality Electronic Design (isqed 2008)

author list (cited authors)

• Wang, V., Agarwal, K., Nassif, S., Nowka, K., & Markovic, D.

citation count

• 9

complete list of authors

• Wang, Victoria||Agarwal, Kanak||Nassif, Sani||Nowka, Kevin||Markovic, Dejan

publication date

• March 2008

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

keywords

• 49 Mathematical Sciences
• 4905 Statistics

Digital Object Identifier (DOI)

• 10.1109/isqed.2008.4479829

International Standard Book Number (ISBN) 10

• 0769531172

International Standard Book Number (ISBN) 13

• 9780769531175

start page

• 734

end page

• 737

URL

• http://dx.doi.org/10.1109/isqed.2008.4479829