Deep subwavelength lithography via tunable terahertz plasmons. Academic Article

abstract

• A scheme to overcome diffraction limit in optical lithography via tunable plasmons is proposed. The plasmons are generated by a current-driven instability and are resonance amplified between the drain and source barriers of the transistor. A series of discrete deep subwavelength can be obtained by controlling the gate voltage. Thus, it is possible to realize lithography with a resolution over 1/100 vacuum wavelength and achieve arbitrary one-dimensional and even simple two-dimensional patterns. Our scheme works in the linear optics regime and is easy to be experimentally realized.

authors

• Zubairy, Muhammad

published proceedings

• Opt Express

author list (cited authors)

• You, J., Zeng, X., & Zubairy, M. S.

citation count

• 0

complete list of authors

• You, Jieyu||Zeng, Xiaodong||Zubairy, M Suhail

publication date

• August 2019

publisher

• Optica Publishing Group  Publisher

published in

• Optics Express  Journal

keywords

• 40 Engineering
• 4018 Nanotechnology
• 51 Physical Sciences

Digital Object Identifier (DOI)

• 10.1364/OE.27.023157

start page

• 23157

end page

• 23163

volume

• 27

issue

• 16

URL

• http://dx.doi.org/10.1364/oe.27.023157