Nitrogen ion implantation into pure iron for formation of surface nitride layer
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© 2019 Elsevier B.V. Low energy N ion implantation into pure Fe was performed to study Fe 1−x N x formation under various ion irradiation conditions. It was shown that after the room-temperature implantation the amount of N introduction reaches a saturation at about 42% atomic density. Increasing N fluences further does not increase N levels. For the N saturated layer, adding post-irradiation annealing causes N out-diffusion at 300 °C and higher temperatures. On the other hand, N implantation at elevated temperatures does not provide extra thermal stability. Transmission electron microscopy and localized diffraction analysis show that the metastable N saturated layer contains a mixture of Fe 3 N and FeN 2 .
author list (cited authors)
Chen, T., Castanon, E., Gigax, J. G., Kim, H., Balerio, R., Fan, J., Garner, F. A., & Shao, L.