Fabrication of a Multi-Level Lens Using Independent-Exposure Lithography and FAB Plasma Etching
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Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography. © 2007 IEEE.
author list (cited authors)
Do Kyun Woo, .., Hane, K., Lee, C. B., & Lee, S. K.