Fabrication of a Multi-Level Lens Using Independent-Exposure Lithography and FAB Plasma Etching Conference Paper uri icon

abstract

  • Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography. 2007 IEEE.

name of conference

  • 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics

published proceedings

  • 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics

author list (cited authors)

  • Woo, D. K., Hane, K., Lee, C. B., & Lee, S. K.

publication date

  • January 1, 2007 11:11 AM

publisher