Fast Atom Beam-Based Fabrication of High-Efficienct Blazed Grating Using Slanting Angle Control of a Substrate Conference Paper

abstract

• This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6 - 1.5 m in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively. 2010 IEEE.

name of conference

• 2010 International Conference on Optical MEMS and Nanophotonics

authors

• Lee, Chabum

published proceedings

• 2010 International Conference on Optical MEMS and Nanophotonics

author list (cited authors)

• Lee, C., Hane, K., & Lee, S.

citation count

• 0

complete list of authors

• Lee, ChaBum||Hane, Kazuhiro||Lee, Sun-Kyu

publication date

• January 2010

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

Digital Object Identifier (DOI)

• 10.1109/omems.2010.5672141

International Standard Book Number (ISBN) 13

• 9781424489251

start page

• 149

end page

• 150

volume

• 1

URL

• http://dx.doi.org/10.1109/omems.2010.5672141