AN AXIAL-DISPERSION MODEL OF COMPETING ION ETCHING AND MIXING OF BINARY SOLIDS Academic Article uri icon

abstract

  • Ion bombardment of solid surfaces produces a number of changes in the nearsurface region. The surface is etched by ejection of material by momentum exchange. The surface concentrations of the components of a multicomponent solid, such as an alloy, are altered by preferential sputtering. Finally, the incident ions penetrate a distance into the solid, producing a damaged region referred to as the altered layer in which diffusion is enhanced relative to that in the unaltered bulk. Previous models have not explicitly accounted for the ion penetration depth and the discontinuity of solid diffusivities at this boundary. We demonstrate that this problem is directly analogous to that of a plugflow reactor with axial dispersion, and solve for steadystate and transient concentration profiles in a binary solid, taking into account the different values of the Peclet number appropriate for the two regions, the altered layer and the unaltered bulk of the solid. Copyright 1993 American Institute of Chemical Engineers

published proceedings

  • AICHE JOURNAL

author list (cited authors)

  • ELIAS, R. J., & BARTEAU, M. A.

citation count

  • 1

complete list of authors

  • ELIAS, RJ||BARTEAU, MA

publication date

  • February 1993

publisher