Method of producing a silicon film with micropores Patent

abstract

• The present invention relates to a method of producing micropores having diameters of less than 20 nanometers in straight sides in silicon film. The silicon film produced by this process may be attached to a substrate material and used as a filter in molecular separation processes.

authors

• Holste, James

author list (cited authors)

• Parker, D., Hall, K., & Holste, J.

complete list of authors

• Parker, Donald||Hall, Kenneth||Holste, James

publication date

• January 1989

URI

• https://hdl.handle.net/1969.1/176886