The effects of edge defects on the switching characteristics of bit patterned media Conference Paper

abstract

• We present the results of micromagnetic studies on realistic patterning defects in perpendicularly oriented magnetic thin films. Both undercut and line edge roughness are investigated systematically with simulations using simple test structures to see the effect of the side wall angle, the roughness amplitude on a nanostructure's switching field, and the roughness period on mathematically tractable figures. We then run simulations of hysteresis loops of actual 200 nm diameter nanostructures using AFM images to define the structure boundary and compare the results to MFM images of DC demagnetized dots. 2007 IEEE.

name of conference

• 2007 7th IEEE Conference on Nanotechnology (IEEE NANO)

authors

• Rantschler, James

published proceedings

• 2011 11th IEEE International Conference on Nanotechnology

author list (cited authors)

• Chunsheng, E., Parekh, V., Rantschler, J. O., Ruchhoeft, P., Khizroev, S., & Litvinov, D.

citation count

• 0

complete list of authors

• Chunsheng, E||Parekh, V||Rantschler, JO||Ruchhoeft, P||Khizroev, S||Litvinov, D

publication date

• January 2007

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

published in

• Proceedings of the ... IEEE Conference on Nanotechnology / co-sponsored by IEEE Robotics and Automation Society (RAS) ... [et al.]. IEEE Conference on Nanotechnology  Journal

Digital Object Identifier (DOI)

• 10.1109/nano.2007.4601220

International Standard Book Number (ISBN) 10

• 1424406080

International Standard Book Number (ISBN) 13

• 9781424406081

start page

• 339

end page

• 340

URL

• http://dx.doi.org/10.1109/nano.2007.4601220