Quantum Entanglement for Optical Lithography and Microscopy Beyond the Rayleigh Limit Conference Paper uri icon

abstract

  • 2001 Optical Soc. Of America. Summary form only given. Recently, Boto et al. (see Phys. Rev. Lett., vol. 85, p. 2773, 2000) showed that using N entangled photons and an N-photon responsive lithographic recording medium, one could potentially write lithographic gratings with a resolution that is N times better than the classical Rayleigh criterion. An anticipated experimental difficulty is that such beams are weak, yet strong fields are needed to excite the N-photon absorption process. For the case of N=2, which was described in detail by Boto et al., we propose a method to overcome this problem. We also propose to use this idea "in reverse" to perform microscopy with better resolution than aloowed by the Rayleigh limit.

name of conference

  • Technical Digest. Summaries of papers presented at the Quantum Electronics and Laser Science Conference. Postconference Technical Digest (IEEE Cat. No.01CH37172)

published proceedings

  • Technical Digest. Summaries of papers presented at the Quantum Electronics and Laser Science Conference. Postconference Technical Digest (IEEE Cat. No.01CH37172)

author list (cited authors)

  • Bentley, S. J., Boyd, R. W., Nagasako, E. M., & Agarwal, G. S.

citation count

  • 0

complete list of authors

  • Bentley, Sean J||Boyd, Robert W||Nagasako, Elna M||Agarwal, Girish S

publication date

  • January 2001