Subwavelength optical lithography via classical light: A possible implementation Academic Article uri icon


  • 2018 American Physical Society. The resolution of an interferometric optical lithography system is about the half wavelength of the illumination light. We proposed a method based on Doppleron resonance to achieve a resolution beyond half wavelength [Phys. Rev. Lett. 96, 163603 (2006)PRLTAO0031-900710.1103/PhysRevLett.96.163603]. Here, we analyze a possible experimental demonstration of this method in the negatively charged silicon-vacancy (SiV-) system by considering realistic experimental parameters. Our results show that quarter wavelength resolution and beyond can be achieved in this system even in room temperature without using perturbation theory.

published proceedings


altmetric score

  • 0.25

author list (cited authors)

  • You, J., Liao, Z., Hemmer, P. R., & Zubairy, M. S.

citation count

  • 4

complete list of authors

  • You, Jieyu||Liao, Zeyang||Hemmer, PR||Zubairy, M Suhail

publication date

  • April 2018