Atom lithography with subwavelength resolution via Rabi oscillations Academic Article

abstract

• We propose two atom lithography techniques with subwavelength resolution based on position-dependent Rabi oscillations. Our method either uses neutral or ionized atoms to write subwavelength patterns. We illustrate our proposal by numerical simulations of an experimental setup using rubidium Rydberg atoms. We show that, for a microwave wavelength of 1.4 cm, a spacing of a few hundred nanometers is possible. 2013 American Physical Society.

authors

• Scully, Marlan

published proceedings

• PHYSICAL REVIEW A

author list (cited authors)

• Liao, Z., Al-Amri, M., Becker, T., Schleich, W. P., Scully, M. O., & Zubairy, M. S.

citation count

• 18

complete list of authors

• Liao, Zeyang||Al-Amri, M||Becker, Thomas||Schleich, WP||Scully, Marlan O||Zubairy, M Suhail

publication date

• February 2013

publisher

• American Physical Society (APS)  Publisher

published in

• Physical Review A: Atomic, Molecular and Optical Physics  Journal

keywords

• 51 Physical Sciences
• 5102 Atomic, Molecular And Optical Physics

Digital Object Identifier (DOI)

• 10.1103/PhysRevA.87.023405

start page

• 023405

volume

• 87

issue

• 2

URL

• http://dx.doi.org/10.1103/physreva.87.023405