Atom lithography with subwavelength resolution via Rabi oscillations
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We propose two atom lithography techniques with subwavelength resolution based on position-dependent Rabi oscillations. Our method either uses neutral or ionized atoms to write subwavelength patterns. We illustrate our proposal by numerical simulations of an experimental setup using rubidium Rydberg atoms. We show that, for a microwave wavelength of 1.4 cm, a spacing of a few hundred nanometers is possible. 2013 American Physical Society.
author list (cited authors)
Liao, Z., Al-Amri, M., Becker, T., Schleich, W. P., Scully, M. O., & Zubairy, M. S.
complete list of authors
Liao, Zeyang||Al-Amri, M||Becker, Thomas||Schleich, WP||Scully, Marlan O||Zubairy, M Suhail