Optimal temperature for development of poly(methylmethacrylate) Academic Article

abstract

• The authors have investigated a range of poly(methylmethacrylate) (PMMA) development temperatures as low as -70 C and characterized their effect on the resolution of PMMA as an electron resist. The results show that cooling, in addition to reducing the sensitivity of the commonly used positive-tone mode of PMMA, also increases the sensitivity of its less commonly used negative-tone mode. They have shown that the resolution-enhancing properties of cold development peak at approximately -15 C as a result of these competing sensitivity changes. At lower temperatures, the high doses required to expose the resist produce significant cross-linking of the polymer, altering its solubility properties and sharply degrading the contrast. If the correct development temperature is used, however, sub- 10 nm features are readily achievable in PMMA-based scanning electron-beam lithography. 2007 American Vacuum Society.

authors

• Lutkenhaus, Jodie

published proceedings

• JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

author list (cited authors)

• Cord, B., Lutkenhaus, J., & Berggren, K. K.

citation count

• 73

complete list of authors

• Cord, Bryan||Lutkenhaus, Jodie||Berggren, Karl K

publication date

• December 2007

publisher

• American Vacuum Society  Publisher

published in

• Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics  Journal

keywords

• 40 Engineering
• 4001 Aerospace Engineering

Digital Object Identifier (DOI)

• 10.1116/1.2799978

start page

• 2013

end page

• 2016

volume

• 25

issue

• 6

URL

• http://dx.doi.org/10.1116/1.2799978