PLASMA SWELLING OF PHOTORESIST Academic Article uri icon

abstract

  • A polymer swelling phenomenon in the hydrogen-containing freon plasma has been observed. The new polymer has a mushroom profile and is very resistant to plasma attack. The swelling rate and the new polymer structure are studied. The swelling process includes 1) new bonds formation, 2) fragments loss, and 3) hydrogenation. The top swollen part and the bottom non-swollen part were compared with the LAMMA (Laser Microprobe Mass Analysis) method. The swollen process is probably caused by the strong ion bombardment in combination with hydrogenation reactions. Possible applications of this new structure are discussed.

published proceedings

  • JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS

author list (cited authors)

  • KUO, Y.

citation count

  • 4

complete list of authors

  • KUO, Y

publication date

  • January 1993