Parallel compression/decompression-based datapath architecture for multibeam mask writers Academic Article uri icon

abstract

  • 2017 Society of Photo-Optical Instrumentation Engineers (SPIE). Multibeam electron beam systems will be used in the future for mask writing and for complementary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements, Amdahl's law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time, we propose an alternate datapath architecture partly motivated by multibeam direct-write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.

published proceedings

  • Journal of Micro/Nanolithography, MEMS, and MOEMS

author list (cited authors)

  • Chaudhary, N., & Savari, S. A.

citation count

  • 0

complete list of authors

  • Chaudhary, Narendra||Savari, Serap A

publication date

  • November 2017