High pressure uniform plasma formation uri icon

abstract

  • An experiment was conducted to produce high pressure uniform plasmas using microwaves by enhancing the electromagnetic wave penetration with magnetic fields. At lower pressures this configuration is commonly used in semiconductor processing plasmas. Normally, the homogeneity and size of radio-frequency and microwave-driven plasmas are limited by insufficient penetration of the electromagnetic waves. Standard cold plasma wave theory including magnetic fields and electron-neutral and ion-neutral collisions has shed light on this issue.

author list (cited authors)

  • Efthimion, P. C., Macheret, S. O., & Miles, R. B.

citation count

  • 0