High pressure uniform plasma formation
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An experiment was conducted to produce high pressure uniform plasmas using microwaves by enhancing the electromagnetic wave penetration with magnetic fields. At lower pressures this configuration is commonly used in semiconductor processing plasmas. Normally, the homogeneity and size of radio-frequency and microwave-driven plasmas are limited by insufficient penetration of the electromagnetic waves. Standard cold plasma wave theory including magnetic fields and electron-neutral and ion-neutral collisions has shed light on this issue.
name of conference
25th International Conference on Plasma Sciences
25th Anniversary, IEEE Conference Record - Abstracts. 1998 IEEE International Conference on Plasma Science (Cat. No.98CH36221)
author list (cited authors)
Efthimion, P. C., Macheret, S. O., & Miles, R. B.
complete list of authors
Efthimion, PC||Macheret, SO||Miles, RB