Retardation of boron diffusion in silicon by defect engineering Academic Article uri icon

abstract

  • By judiciously placing vacancy and interstitial defects at different depths, we are able to enhance or retard boron diffusion. This opens up a new approach for the formation of shallow P+n junction in silicon. After preimplantation with 50 or 500 keV Si+ ions to produce a surface vacancy-rich region, we studied the diffusion of deposited B on predamaged samples with annealing between 900 and 1010C. Boron diffusion retardation was observed in both implantation conditions after low temperature annealing with enhancement occurring in a 50 keV implanted sample at high temperature. Choosing high energy implantation to separate vacancies and interstitials can reduce the boron diffusion significantly. Such suppression became more obvious with higher implant doses. A junction less than 10 nm deep (at 11017cm3 according to carrier concentration profiles) can be formed.

published proceedings

  • Applied Physics Letters

author list (cited authors)

  • Shao, L., Lu, X., Wang, X., Rusakova, I., Liu, J., & Chu, W.

citation count

  • 40

complete list of authors

  • Shao, Lin||Lu, Xinming||Wang, Xuemei||Rusakova, Irene||Liu, Jiarui||Chu, Wei-Kan

publication date

  • April 2001