Quantitative measurement of sheet resistance by evanescent microwave probe Academic Article

abstract

• Quantitative measurement of microwave sheet resistance by a novel type of near-field microwave microscopeEvanescent Microwave Probe (EMP)has been demonstrated. The data cover a wide range of sheet resistance from the metal limit to the insulator limit. Both finite element analysis (FEA) and a simple coaxial ring model have been shown to fit the data well. The demonstration of sheet resistance measurement with high spatial resolution in the GHz range shows the potential of EMP for semiconductor metrology applications. The data also reveal issues related to the large penetration depth, allowing substrate properties to affect the signal.

authors

• Shao, Lin

published proceedings

• Applied Physics Letters

author list (cited authors)

• Wang, Z., Kelly, M. A., Shen, Z., Shao, L., Chu, W., & Edwards, H.

citation count

• 33

complete list of authors

• Wang, Zhengyu||Kelly, Michael A||Shen, Zhi-Xun||Shao, Lin||Chu, Wei-Kan||Edwards, Hal

publication date

• April 2005

publisher

• AIP Publishing  Publisher

published in

• Applied Physics Letters  Journal

keywords

• 40 Engineering
• 51 Physical Sciences
• 5104 Condensed Matter Physics

Digital Object Identifier (DOI)

• 10.1063/1.1891296

start page

• 153118

end page

• 3

volume

• 86

issue

• 15

URL

• http://dx.doi.org/10.1063/1.1891296