Micromachined arrayed dip pen nanolithography probes for sub-100 nm direct chemistry patterning
- Additional Document Info
- View All
We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.
name of conference
IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems
The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE
author list (cited authors)
Bullen, D., Xuefeng Wang, .., Jun Zou, .., Seunghun Hong, .., Sung-Wook Chung, .., Kee Ryu, .., ... Chang Liu.
complete list of authors