Micromachined arrayed dip pen nanolithography probes for sub-100 nm direct chemistry patterning Conference Paper uri icon

abstract

  • We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

name of conference

  • IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems

published proceedings

  • The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE

altmetric score

  • 3

author list (cited authors)

  • Bullen, D., Xuefeng Wang, .., Jun Zou, .., Seunghun Hong, .., Sung-Wook Chung, .., Kee Ryu, .., ... Chang Liu.

citation count

  • 6

complete list of authors

  • Bullen, D||Mirkin, C

publication date

  • January 2003

publisher