Micromachined Arrayed Dip Pen Nanolithography Probes for Sub-100nm Direct Chemistry Patterning Conference Paper

abstract

• We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

name of conference

• The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE

authors

• Zou, Jun

published proceedings

• The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE

altmetric score

• 3

author list (cited authors)

• Bullen, D., Wang, X., Zou, J., Hong, S., Chung, S., Ryu, K., ... Liu, C.

citation count

• 6

complete list of authors

• Bullen, David||Wang, Xuefeng||Zou, Jun||Hong, Seunghun||Chung, Sung-Wook||Ryu, Kee||Fan, Zhifang||Mirkin, Chad||Liu, Chang

publication date

• January 2003

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

Digital Object Identifier (DOI)

• 10.1109/memsys.2003.1189673

start page

• 4

end page

• 7

URL

• http://dx.doi.org/10.1109/memsys.2003.1189673