Current induced organization in thin nanocrystalline gold films during deposition Conference Paper uri icon


  • ABSTRACTNanocrystalline gold films were prepared by advanced gas deposition. Electric field induced effects on the film structure during and after deposition was investigated. A dc electric field in the range 2 Ua 8 V/cm, was applied parallel to the substrate surface and led to changes of film microstructure and resistivity. In another set of experiments, films deposited at Ua = 0 were exposed to electric fields of similar strength after deposition. Film degradation could be understood from a mechanism consistent with a biased-percolation effect. Our results show that it is possible to control the film structure by varying the strength of an applied electric field.

published proceedings

  • MRS Advances

author list (cited authors)

  • Chaoguang, P., Ederth, J., Kish, L. B., & Granqvist, C. G.

citation count

  • 0

complete list of authors

  • Chaoguang, P||Ederth, J||Kish, LB||Granqvist, CG

publication date

  • January 2001