Current induced organization in thin nanocrystalline gold films during deposition Conference Paper

abstract

• ABSTRACTNanocrystalline gold films were prepared by advanced gas deposition. Electric field induced effects on the film structure during and after deposition was investigated. A dc electric field in the range 2 Ua 8 V/cm, was applied parallel to the substrate surface and led to changes of film microstructure and resistivity. In another set of experiments, films deposited at Ua = 0 were exposed to electric fields of similar strength after deposition. Film degradation could be understood from a mechanism consistent with a biased-percolation effect. Our results show that it is possible to control the film structure by varying the strength of an applied electric field.

authors

• Kish, Laszlo

published proceedings

• MRS Advances

author list (cited authors)

• Chaoguang, P., Ederth, J., Kish, L. B., & Granqvist, C. G.

citation count

• 0

complete list of authors

• Chaoguang, P||Ederth, J||Kish, LB||Granqvist, CG

publication date

• December 2001

publisher

• Springer Nature  Publisher

published in

• MRS Online Proceedings Library  Journal

keywords

• 34 Chemical Sciences
• 3403 Macromolecular And Materials Chemistry
• 3406 Physical Chemistry
• 40 Engineering
• 4016 Materials Engineering

Digital Object Identifier (DOI)

• 10.1557/proc-676-y8.1

start page

• y8.1

volume

• 676

URL

• http://dx.doi.org/10.1557/proc-676-y8.1