Developing a systematic approach to metal gates and high-k dielectrics in future-generation CMOS
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Majhi, P., Wen, H. C., Alshareef, H., Harris, H. R., Luan, H., Choi, K., ... Jammy, R.
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Majhi, P||Wen, HC||Alshareef, H||Harris, HR||Luan, H||Choi, K||Park, CS||Song, SC||Lee, BH||Jammy, R
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