A novel micromachining technique for the batch fabrication of scanning probe arrays with precisely defined tip contact areas
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This paper reports a novel micromachining technique for the batch fabrication of scanning probe arrays with different tip contact areas. Based on the bulk micromachining of silicon-on-insulator substrates, it eliminates the need for time-dependent etching processes and thus is capable of simultaneously fabricating both 'sharp' and 'blunt' scanning probes with precisely defined tip contact areas in a controllable and repeatable manner. As an example of the application of this probe fabrication technique, prototype scanning probe arrays have been successfully fabricated and used to demonstrate variable-resolution scanning probe lithography of fluorescent dyes in a parallel mode. © 2008 IOP Publishing Ltd.
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