An information theoretic perspective on e-beam direct-write as complementary lithography Academic Article

abstract

• 2014 American Vacuum Society. The semiconductor industry is pursuing unidirectional and gridded layouts as an approach to enable high-volume manufacturing for advanced technology nodes. Complementary lithography is a two-step scheme for fabricating such layouts where optical lithography produces unidirectional lines at a fixed pitch and electron-beam direct-write (EBDW) lithography cuts those lines. Since low throughput and high data volumes in the patterning of wafers are challenges facing EBDW lithography, the author considers theoretical and practical aspects of lossless data compression for the transfer of cut images.

authors

• Savari, Serap

published proceedings

• JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

author list (cited authors)

• Savari, S. A.

citation count

• 4

complete list of authors

• Savari, Serap A

publication date

• January 2014

publisher

• American Vacuum Society  Publisher

published in

• n2166-2746ISSN  Journal

Digital Object Identifier (DOI)

• 10.1116/1.4894459

start page

• 06f502

end page

• 06F502

volume

• 32

issue

• 6

URL

• http%3A%2F%2Fdx.doi.org%2F10.1116%2F1.4894459