Secrets of subwavelength imaging and lithography Conference Paper

abstract

• To understand the limits and tradeoffs of nearly all existing subwavelength imaging techniques it sufficient to understand magnetic resonance imaging (MRI) and its generalizations. In many cases, subwavelength optical lithography can be viewed as the inverse problem to imaging and so the same principles apply. A simple review of MRI is given which shows how the most popular subwavelength imaging and lithography techniques naturally arise as special cases. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).

name of conference

• Quantum Communications and Quantum Imaging IX

authors

• Hemmer, Philip

published proceedings

• QUANTUM COMMUNICATIONS AND QUANTUM IMAGING IX

author list (cited authors)

• Hemmer, P. R.

citation count

• 0

complete list of authors

• Hemmer, Philip R

editor list (cited editors)

• Meyers, R. E., Shih, Y., & Deacon, K. S.

publication date

• September 2011

publisher

• SPIE, the international society for optics and photonics  Publisher

published in

• Proceedings of SPIE  Journal

keywords

• Diffraction Limit
• Optical Lithography
• Subwavelength Imaging

Digital Object Identifier (DOI)

• 10.1117/12.894581

International Standard Book Number (ISBN) 13

• 9780819487735

start page

• 816303-816303-6

volume

• 8163

URL

• http%3A%2F%2Fdx.doi.org%2F10.1117%2F12.894581