Deep-subwavelength lithography via graphene plasmons Academic Article uri icon

abstract

  • © 2017 American Physical Society. We propose a scheme to overcome diffraction limit in optical lithography via graphene-plasmon (GP) interference. Taking advantage of the novel properties of GPs - tunability, low loss, and extremely large wave number - we can realize lithography with a resolution up to 1/100 wavelength in arbitrary one- and even simple two-dimensional patterns. An advantage of this method is that it works in the linear optics regime and does not require either multiphoton absorption materials or strong intensity lasers.

published proceedings

  • Physical Review A

author list (cited authors)

  • Zeng, X., Fan, L., & Zubairy, M. S

citation count

  • 14

complete list of authors

  • Zeng, Xiaodong||Fan, Longfei||Zubairy, M Suhail

publication date

  • May 2017