Deep-subwavelength lithography via graphene plasmons Academic Article uri icon


  • 2017 American Physical Society. We propose a scheme to overcome diffraction limit in optical lithography via graphene-plasmon (GP) interference. Taking advantage of the novel properties of GPs - tunability, low loss, and extremely large wave number - we can realize lithography with a resolution up to 1/100 wavelength in arbitrary one- and even simple two-dimensional patterns. An advantage of this method is that it works in the linear optics regime and does not require either multiphoton absorption materials or strong intensity lasers.

published proceedings


author list (cited authors)

  • Zeng, X., Fan, L., & Zubairy, M. S.

citation count

  • 15

complete list of authors

  • Zeng, Xiaodong||Fan, Longfei||Zubairy, M Suhail

publication date

  • May 2017