Deep-subwavelength lithography via graphene plasmons
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2017 American Physical Society. We propose a scheme to overcome diffraction limit in optical lithography via graphene-plasmon (GP) interference. Taking advantage of the novel properties of GPs - tunability, low loss, and extremely large wave number - we can realize lithography with a resolution up to 1/100 wavelength in arbitrary one- and even simple two-dimensional patterns. An advantage of this method is that it works in the linear optics regime and does not require either multiphoton absorption materials or strong intensity lasers.