Novel optical technique for microscopic imaging of water stains
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We propose and experimentally demonstrate a fluorescent imaging technique for surface quality control of wet-cleaned silicon wafers. This simple technique allows sub-micron resolution and fast scanning, while it reveals significant information about water stains distribution. Distribution of water stains is measured using this novel technique and correlated to the surface structure.
author list (cited authors)
Yakovlev, V. V., Mikhaylichenko, K., & Ravkin, M.