Novel techniques for microscopic imaging of semiconductor surfaces uri icon

abstract

  • Several optical techniques for microscopic diagnosis of semiconductor materials were developed and applied to semiconductor surfaces. The imaging of water stains, microcracks and other surface impurities was performed. The use of third-harmonic generation microscopy and fluorescence confocal microscopy was successfully applied for the structural analysis.

published proceedings

  • COMMERICAL AND BIOMEDICAL APPLICATIONS OF ULTRASHORT PULSE LASERS; LASER PLASMA GENERATION AND DIAGNOSTICS

author list (cited authors)

  • Yakovlev, V. V., Mikhaylichenko, K., & Govorkov, S. V.

citation count

  • 0

complete list of authors

  • Yakovlev, VV||Mikhaylichenko, K||Govorkov, SV

editor list (cited editors)

  • Haglund, Jr., R. F., Neev, J., & Wood, R. F.

publication date

  • May 2001