Novel techniques for microscopic imaging of semiconductor surfaces Academic Article

abstract

• Several optical techniques for microscopic diagnosis of semiconductor materials were developed and applied to semiconductor surfaces. The imaging of water stains, microcracks and other surface impurities was performed. The use of third-harmonic generation microscopy and fluorescence confocal microscopy was successfully applied for the structural analysis.

authors

• Yakovlev, Vladislav

published proceedings

• COMMERICAL AND BIOMEDICAL APPLICATIONS OF ULTRASHORT PULSE LASERS; LASER PLASMA GENERATION AND DIAGNOSTICS

author list (cited authors)

• Yakovlev, V. V., Mikhaylichenko, K., & Govorkov, S. V.

citation count

• 0

complete list of authors

• Yakovlev, VV||Mikhaylichenko, K||Govorkov, SV

editor list (cited editors)

• Haglund, Jr., R. F., Neev, J., & Wood, R. F.

publication date

• May 2001

publisher

• SPIE, the international society for optics and photonics  Publisher

published in

• Proceedings of SPIE  Journal

keywords

• Confocal
• Femtosecond
• Harmonic Generation
• Multiphoton
• Nonlinear Optics
• Semiconductor

Digital Object Identifier (DOI)

• 10.1117/12.428011

start page

• 17

end page

• 24

volume

• 4276