Novel technique for microscopic imaging (quality control) of silicon wafers Academic Article uri icon

abstract

  • We propose and experimentally demonstrate a fluorescent imaging technique for surface quality control of wet-cleaned silicon wafers. This simple technique allows macro- and microscopic imaging. Submicron resolution and fast scanning are successfully demonstrated. Distribution of water stains is measured using this novel technique and correlated to the surface structure. 2001 SPIE 1605-7422/01/$15.00.

published proceedings

  • MACHINE VISION APPLICATIONS IN INDUSTRIAL INSPECTION X

author list (cited authors)

  • Yakovlev, V. V., Mikhaylichenko, K., & Ravkin, M.

citation count

  • 0

complete list of authors

  • Yakovlev, VV||Mikhaylichenko, K||Ravkin, M

editor list (cited editors)

  • Hunt, M. A.

publication date

  • March 2002