Microscopic imaging of semiconductor surfaces and interfaces Academic Article uri icon

abstract

  • Spectroscopic techniques for microscopic imaging of surfaces and interfaces were demonstrated. Water stains on the surface of semiconductors and crystal structure of the surface layers were analyzed. Microscopic quality control of wet cleaning process in semiconductor device manufacture was examined. Results showed that fluorescence signals could reveal the distribution of water stains on the surfaces. Society of Photo-Optical Instrumentation Engineers.

published proceedings

  • ICONO 2001: NOVEL TRENDS IN NONLINEAR LASER SPECTROSCOPY AND OPTICAL DIAGNOSTICS AND LASER IN CHEMISTRY, BIOPHYSICS, AND BIOMEDICINE

author list (cited authors)

  • Yakovlev, V. V., Mikhailichenko, K., & Govorkov, S. V.

citation count

  • 0

editor list (cited editors)

  • Chikishev, A. Y., Orlovich, V. A., Rubinov, A. N., & Zheltikov, A. M.

publication date

  • May 2001