Effects of post metallization annealing on the electrical reliability of ultra-thin HfO/sub 2/ films with MoN and WN gate electrodes Conference Paper uri icon

name of conference

  • 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual.

published proceedings

  • 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual.

author list (cited authors)

  • Chatterjee, S., Kuo, Y., Lu, J., Tewg, J., & Majhi, P.

citation count

  • 1

complete list of authors

  • Chatterjee, S||Kuo, Y||Lu, J||Tewg, J-Y||Majhi, P

publication date

  • January 2005

publisher