Tantalum nitride interface layer influence on dielectric properties of hafnium doped tantalum oxide high dielectric constant thin films

authors

• Kuo, Yue

published proceedings

• JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS

author list (cited authors)

• Kuo, Y., Lu, J., & Tewg, J. Y.

citation count

• 17

complete list of authors

• Kuo, Y||Lu, J||Tewg, JY

publication date

• July 2003

publisher

• IOP Publishing  Publisher

published in

• Japanese Journal of Applied Physics  Journal

keywords

• Hafnium-doped Tantalum Oxide
• High K Dielectric
• Interface
• Tantalum Oxide
• Tanx Interface

Digital Object Identifier (DOI)

• 10.1143/JJAP.42.L769

start page

• L769

end page

• L771

volume

• 42

issue

• 7A

URL

• http%3A%2F%2Fdx.doi.org%2F10.1143%2Fjjap.42.l769