Beyond the Rayleigh Limit in Optical Lithography Chapter

abstract

• It is well-known that traditional optical lithography is restricted by the Rayleigh limit such that the smallest feature that can be generated is restricted to half the wavelength of the light source. Thus light beams with shorter and shorter wavelength have been applied to print smaller and smaller circuit images. However, when it comes to the extreme ultraviolet or X-ray, severe problems can emerge. In the past 10-15. years, several novel optical lithography schemes have been illustrated to overcome the diffraction limit. In this article, we review these schemes and explain their basic principles with possible experimental realizations. 2012 Elsevier Inc.

authors

• Zubairy, Muhammad

author list (cited authors)

• Al-Amri, M., Liao, Z., & Zubairy, M. S.

citation count

• 12

complete list of authors

• Al-Amri, Mohammad||Liao, Zeyang||Zubairy, M Suhail

Book Title

• ADVANCES IN ATOMIC, MOLECULAR, AND OPTICAL PHYSICS, VOL 61

publication date

• January 2012

publisher

• Elsevier  Publisher

published in

• Advances in Atomic, Molecular and Optical Physics  Journal

Digital Object Identifier (DOI)

• 10.1016/b978-0-12-396482-3.00008-9

International Standard Book Number (ISBN) 13

• 978-0-12-396482-3

start page

• 409

end page

• 466

volume

• 61

URL

• http://dx.doi.org/10.1016/b978-0-12-396482-3.00008-9