Overcoming Rayleigh Limit in Optical Lithography Conference Paper

abstract

• We shall discuss methods to overcome the Rayleigh limit in optical lithography. Our proposed methods are all based on classical light interaction with suitable photoresists. OSA 2014.

name of conference

• Latin America Optics and Photonics Conference

authors

• Zubairy, Muhammad

published proceedings

• Latin America Optics and Photonics Conference

author list (cited authors)

• Zubairy, M. S.

citation count

• 0

complete list of authors

• Zubairy, M Suhail

publication date

• November 2014

publisher

• Optica Publishing Group  Publisher

Digital Object Identifier (DOI)

• 10.1364/laop.2014.lm1b.3

International Standard Book Number (ISBN) 13

• 9781557528254

start page

• lm1b.3

URL

• http://dx.doi.org/10.1364/laop.2014.lm1b.3