Overcoming Rayleigh Limit in Optical Lithography Conference Paper uri icon

abstract

  • We shall discuss methods to overcome the Rayleigh limit in optical lithography. Our proposed methods are all based on classical light interaction with suitable photoresists. © OSA 2014.

name of conference

  • Latin America Optics and Photonics Conference

published proceedings

  • Latin America Optics and Photonics Conference

author list (cited authors)

  • Zubairy, M. S

citation count

  • 0

complete list of authors

  • Zubairy, M Suhail

publication date

  • January 2014

publisher

  • OSA  Publisher