Novel plasma-based copper dry etching method Academic Article uri icon

abstract

  • A new copper dry etching method has been discovered and studied. The process on an unique HCl plasma-copper reaction that forms a solution soluble copper chloride compound. The physical (e.g., morphology, profile, volume expansion, and anisotropy) and chemical (e.g., reaction mechanism) aspects of the solid-state copper chloride growth mechanism have been delineated. This new process is applicable to the copper interconnection technology for advanced microelectronic and optoelectronic devices and circuits.

published proceedings

  • Japanese Journal of Applied Physics, Part 2: Letters

author list (cited authors)

  • Kuo, Y., & Lee, S.

complete list of authors

  • Kuo, Y||Lee, S

publication date

  • March 2000