Electro-optic intensity modulators at lambda=1.55 mu m utilizing strain-optic effects in LiNbO3 Academic Article

abstract

• Electro-optic intensity modulators at = 1.55 m are produced in LiNbO3 substrates using strain-induced channel waveguides formed by magnetron deposition of a surface metal film and lift-off technology, The static strain resulting from thermal expansion mismatch between the substrate and the metal film that is caused by the plasma temperature during deposition induces a localized increase in the refractive index via the strain-optic effect. Modulation depth of 100% at a -rad voltage of 16.1 V is demonstrated. Electro-optic modulation behaviours in channel waveguides fabricated using strain inducing surface metal film are compared to ones formed by thick SiO2 surface film. 2001 Society of Photo-Optical Instrumentation Engineers.

authors

• Eknoyan, Ohannes

published proceedings

• OPTICAL ENGINEERING

author list (cited authors)

• Jung, H. S., Eknoyan, O., & Taylor, H. F.

citation count

• 2

complete list of authors

• Jung, HS||Eknoyan, O||Taylor, HF

publication date

• January 2001

publisher

• SPIE, the international society for optics and photonics  Publisher

published in

• Optical Engineering  Journal

keywords

• Electro-optic Effect
• Linbo3
• Optical Waveguide
• Strain-induced Intensity Modulator
• Strain-optic Effect

Digital Object Identifier (DOI)

• 10.1117/1.1386369

start page

• 1499

end page

• 1501

volume

• 40

issue

• 8

URL

• http%3A%2F%2Fdx.doi.org%2F10.1117%2F1.1386369