Library cell layout with Alt-PSM compliance and composability Conference Paper uri icon

abstract

  • The sustained miniaturization of VLSI feature size presents great challenges to sub-wavelength photolithography and requests usage of many Resolution Enhancement Techniques (RET). The difficulty and feasibility of deploying the RET such as Alternating Phase Shifting Mask (Alt-PSM) depend heavily on circvut layout. In this paper, we propose a Boolean satisfiability (SAT) based library cell layout method that can achieve Alt-PSM compliance and composability in a constructive manner. Compared to previously reported post processing approach, our method often leads to further cell area efficiency improvement. 2005 IEEE.

published proceedings

  • ASP-DAC 2005: PROCEEDINGS OF THE ASIA AND SOUTH PACIFIC DESIGN AUTOMATION CONFERENCE, VOLS 1 AND 2

author list (cited authors)

  • Cao, K. e., Dhawan, P., & Hu, J.

complete list of authors

  • Cao, Ke||Dhawan, Puneet||Hu, Jiang

publication date

  • January 1, 2005 11:11 AM