Patterning chalcogenide glass by direct resist-free thermal nanoimprint
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In this article, patterning As2 S3 chalcogenide glass is investigated from a nanoimprint perspective. Thermal nanoimprint was used to successfully pattern As2 S3 microstructures. Due to the high melt viscosity of As2 S3, patterns of a few microns and submicrons can be well formed, while larger patterns cannot be faithfully replicated due to limited melt flow when a thin initial film is used. Accelerated crystallite formation after nanoimprint was observed and a method to suppress crystallites was explored. In patterned As2 S3 microstructures, optical birefringence was observed near the pattern edges, which potentially has a significant impact on the optical properties of patterned microstructures. It was also observed that significant surfactant wear occurs after just a few nanoimprints. A new surfactant with better temperature stability was proposed and its durability was compared to commonly used nanoimprint surfactant such as heptadecafluoro-1,1,2,2-tetrahydrodecyl trichlorosilane. 2008 American Vacuum Society.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
author list (cited authors)
Solmaz, M., Park, H., Madsen, C. K., & Cheng, X.
complete list of authors
Solmaz, M||Park, H||Madsen, CK||Cheng, X