Patterning chalcogenide glass by direct resist-free thermal nanoimprint Academic Article uri icon

abstract

  • In this article, patterning As2 S3 chalcogenide glass is investigated from a nanoimprint perspective. Thermal nanoimprint was used to successfully pattern As2 S3 microstructures. Due to the high melt viscosity of As2 S3, patterns of a few microns and submicrons can be well formed, while larger patterns cannot be faithfully replicated due to limited melt flow when a thin initial film is used. Accelerated crystallite formation after nanoimprint was observed and a method to suppress crystallites was explored. In patterned As2 S3 microstructures, optical birefringence was observed near the pattern edges, which potentially has a significant impact on the optical properties of patterned microstructures. It was also observed that significant surfactant wear occurs after just a few nanoimprints. A new surfactant with better temperature stability was proposed and its durability was compared to commonly used nanoimprint surfactant such as heptadecafluoro-1,1,2,2-tetrahydrodecyl trichlorosilane. 2008 American Vacuum Society.

published proceedings

  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

altmetric score

  • 6

author list (cited authors)

  • Solmaz, M., Park, H., Madsen, C. K., & Cheng, X.

citation count

  • 35

complete list of authors

  • Solmaz, M||Park, H||Madsen, CK||Cheng, X

publication date

  • January 2008