Nanowear of Hafnium Diboride Thin Films Academic Article uri icon

abstract

  • Chemical Vapor Deposition-grown HfB 2 films were subjected to nanowear testing at normal loads of 50-500 μN. The material response was investigated by measuring residual wear depths and wear scar roughness and by calculating wear rates and specific energies. Films annealed for 1 h at 800° C showed significant reduction in wear rate and required a higher critical energy for wear, compared to as-deposited HfB 2 films. Analysis of roughness of the worn scars revealed that plowing effect dominates at higher loads (200-500 μN), whereas at lower loads, asperity flattening dominates. The excellent response of annealed HfB 2 films to nanotribological testing demonstrates the poten1tial of these films for applications requiring high wear resistance at the nanoscale.

author list (cited authors)

  • Chatterjee, A., Kumar, N., Abelson, J. R., Bellon, P., & Polycarpou, A. A.

citation count

  • 9

publication date

  • August 2010