Nanowear of Hafnium Diboride Thin Films Academic Article

abstract

• Chemical Vapor Deposition-grown HfB 2 films were subjected to nanowear testing at normal loads of 50-500 N. The material response was investigated by measuring residual wear depths and wear scar roughness and by calculating wear rates and specific energies. Films annealed for 1 h at 800 C showed significant reduction in wear rate and required a higher critical energy for wear, compared to as-deposited HfB 2 films. Analysis of roughness of the worn scars revealed that plowing effect dominates at higher loads (200-500 N), whereas at lower loads, asperity flattening dominates. The excellent response of annealed HfB 2 films to nanotribological testing demonstrates the poten1tial of these films for applications requiring high wear resistance at the nanoscale.

authors

• Polycarpou, Andreas

published proceedings

• TRIBOLOGY TRANSACTIONS

author list (cited authors)

• Chatterjee, A., Kumar, N., Abelson, J. R., Bellon, P., & Polycarpou, A. A.

citation count

• 10

complete list of authors

• Chatterjee, Abhishek||Kumar, Navneet||Abelson, John R||Bellon, Pascal||Polycarpou, Andreas A

publication date

• August 2010

publisher

• Taylor & Francis  Publisher

published in

• Tribology Transactions  Journal

keywords

• Afm
• Hfb2 Coatings
• Nanowear
• Surface Roughness

Digital Object Identifier (DOI)

• 10.1080/10402001003753341

start page

• 731

end page

• 738

volume

• 53

issue

• 5

URL

• http://dx.doi.org/10.1080/10402001003753341