GROWTH AND INTERDIFFUSION OF ULTRATHIN FILMS OF TI AND NI ON MO(110) Academic Article uri icon

abstract

  • The growth and interdiffusion of Ti and Ni on a Mo(110) surface have been studied by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and temperature programmed desorption spectroscopy (TPD). Ti grows layer-by-layer upon deposition on Mo(110) at 115 K, whereas annealing multilayers of Ti to 900 K causes formation of Ti three-dimensional clusters. Submonolayer Ti on Mo(110), annealed to 300-700 K, induces a LEED pattern interpreted to arise from a Ti overlayer with a distorted Ti (0001) lattice. This pattern disappears upon annealing above 700 K, consistent with a phase transition from a distorted Ti (0001) lattice to a pseudomorphic structure. On a Mo (110) surface first covered with Ni and then Ti (or deposited in the reverse order), Ti and Ni interdiffuse to form a Ti-Ni compound when annealed above 300 K. 1990.

published proceedings

  • MATERIALS LETTERS

author list (cited authors)

  • HE, J. W., GOODMAN, D. W., NAUGLE, D. G., & COCKE, D. L.

citation count

  • 3

complete list of authors

  • HE, JW||GOODMAN, DW||NAUGLE, DG||COCKE, DL

publication date

  • December 1990