DOPING PROCESS-CONTROL IN SILICON EPITAXY (III) - REALIZATION OF OPTIMUM CONTROL FUNCTION
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CRYSTAL RESEARCH AND TECHNOLOGY
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RICHTER, F., KOSZA, G., SPERLING, R., & VALKO, P.
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RICHTER, F||KOSZA, G||SPERLING, R||VALKO, P
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http%3A%2F%2Fdx.doi.org%2F10.1002%2Fcrat.2170200716