CHARACTERIZATION OF TANTALUM PENTOXIDE FILMS WITH BACKSCATTERING SPECTROMETRY
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The backscattering performance of 2 MeV He+ and N+ beams was studied using Ta2O5 targets as test targets. To allow ready comparison, the scattering geometry, projectile energy, and detection system were kept identical for both beams. Tantalum oxide films with thicknesses of 200 to 4000 were examined. For thickness determinations, beam straggling was found to be the major limiting factor. For thickness measurements below 1000 the N+ beam is best suited for larger thicknesses; the He+ beam is superior. For stoichiometric determinations both beams provide equally accurated and precise data. 1985 Akadmiai Kiad.