Probing silicon substitution in molecular sieves by plasma desorption mass spectrometry Academic Article uri icon

abstract

  • Plasma desorption was used to produce secondary ion mass spectra from samples of unsubstituted and substituted aluminum phosphate materials. The yield of fingerprint ions representative of silicon oxide solids indicates that the incorporation of silicon into the material during synthesis and following calcination occurs via the formation of silicon-rich islands. Complementary X-ray photoelectron data provide supporting evidence that the surface of the substituted aluminum phosphate material becomes silicon rich and phosphorus depleted. No changes in the unsubstituted and substituted material with respect to composition and phase were detected using powder X- ray diffraction.

published proceedings

  • JOURNAL OF MOLECULAR STRUCTURE

author list (cited authors)

  • Van Stipdonk, M. J., von Heimburg, S. L., & Schweikert, E. A.

citation count

  • 0

complete list of authors

  • Van Stipdonk, MJ||von Heimburg, SL||Schweikert, EA

publication date

  • October 1998