METHODOLOGY AND APPLICATION OF THE NUCLEAR-RESONANCE REACTION O-16(ALPHA, ALPHA)O-16 FOR THE PROFILING OF TITANIUM-OXIDE Academic Article uri icon

abstract

  • A method is presented for the application of the 16O(,)16O resonance at 3.045 MeV to the depth profiling of oxide films. The resonance yield is translated into oxygen to metal stoichiometry as a function of the depth probed. The method is applied to anodic titanium oxide films grown in the absence and presence of tungsten anions. The oxygen depth profile is then utilized to obtain the profile of the dopants (W) incorporated in the oxide. A depth resolution of 6 g/cm is achieved. The incorporation of tungsten anions of the order of 2 at.%, evaluated from the RBS yields, precludes the establishment of a constant oxygen to metal stoichiometry in the doped film. The tungsten atomic fractions have an estimated error of 5%. 1988.

published proceedings

  • NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

author list (cited authors)

  • PATNAIK, B. K., LEITE, C., BAPTISTA, G. B., SCHWEIKERT, E. A., COCKE, D. L., QUINONES, L., & MAGNUSSEN, N.

citation count

  • 35

complete list of authors

  • PATNAIK, BK||LEITE, CVB||BAPTISTA, GB||SCHWEIKERT, EA||COCKE, DL||QUINONES, L||MAGNUSSEN, N

publication date

  • December 1988