Depth profiling using C60+ SIMSDeposition and topography development during bombardment of silicon
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A C 60+ primary ion source has been coupled to an ion microscope secondary ion mass spectrometry (SIMS) instrument to examine sputtering of silicon with an emphasis on possible application of C 60+ depth profiling for high depth resolution SIMS analysis of silicon semiconductor materials. Unexpectedly, C 60+ SIMS depth profiling of silicon was found to be complicated by the deposition of an amorphous carbon layer which buries the silicon substrate. Sputtering of the silicon was observed only at the highest accessible beam energies (14.5 keV impact) or by using oxygen backfilling. C 60+ SIMS depth profiling of As delta-doped test samples at 14.5 keV demonstrated a substantial (factor of 5) degradation in depth resolution compared to Cs + SIMS depth profiling. This degradation is thought to result from the formation of an unusual platelet-like grain structure on the SIMS crater bottoms. Other unusual topographical features were also observed on silicon substrates after high primary ion dose C 60+ bombardment. 2006 Elsevier B.V. All rights reserved.
author list (cited authors)
Gillen, G., Batteas, J., Michaels, C. A., Chi, P., Small, J., Windsor, E., ... Kim, K. J.
complete list of authors
Gillen, Greg||Batteas, James||Michaels, Chris A||Chi, Peter||Small, John||Windsor, Eric||Fahey, Albert||Verkouteren, Jennifer||Kim, KJ