Low-Stress Silicon Nitride Platform for Broadband Mid-Infrared Microphotonics
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2014 Optical Society of America. We experimentally demonstrate a sophisticated mid-IR microphotonics platform adopting engineered Si-rich and low-stress silicon nitride (SiNx) thin films where an extensive infrared transparency up to= 8.5m is achieved. Furthermore, because of the designed lowstress property, the SiNx deposition is able to reach a thickness > 2m that significantly reduces mid-IR waveguide loss to less than 0.2 dB/cm. We show directional couplers functioning over a broad infrared spectrum, thus enabling monolithic mid-IR multiplexing schemes for integrated linear and nonlinear photonics leading to sophisticated label-free sensing technologies.